Invention Grant
- Patent Title: Stress regulated semiconductor devices and associated methods
- Patent Title (中): 应力调节半导体器件及相关方法
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Application No.: US13284900Application Date: 2011-10-29
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Publication No.: US08778784B2Publication Date: 2014-07-15
- Inventor: Chien-Min Sung , Ming Chi Kan , Shao Chung Hu
- Applicant: Chien-Min Sung , Ming Chi Kan , Shao Chung Hu
- Applicant Address: TW Hsin Chu Industrial Park
- Assignee: RiteDia Corporation
- Current Assignee: RiteDia Corporation
- Current Assignee Address: TW Hsin Chu Industrial Park
- Agency: Thorpe North & Western LLP
- Main IPC: H01L21/20
- IPC: H01L21/20

Abstract:
Stress regulated semiconductor devices and associated methods are provided. In one aspect, for example, a stress regulated semiconductor device can include a semiconductor layer, a stress regulating interface layer including a carbon layer formed on the semiconductor layer, and a heat spreader coupled to the carbon layer opposite the semiconductor layer. The stress regulating interface layer is operable to reduce the coefficient of thermal expansion difference between the semiconductor layer and the heat spreader to less than or equal to about 10 ppm/° C.
Public/Granted literature
- US20120280253A1 Stress Regulated Semiconductor Devices and Associated Methods Public/Granted day:2012-11-08
Information query
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