发明授权
- 专利标题: Illumination optical apparatus, exposure apparatus, and device manufacturing method
- 专利标题(中): 照明光学装置,曝光装置和装置的制造方法
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申请号: US12703270申请日: 2010-02-10
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公开(公告)号: US08780328B2公开(公告)日: 2014-07-15
- 发明人: Hideki Komatsuda
- 申请人: Hideki Komatsuda
- 申请人地址: JP Tokyo
- 专利权人: Nikon Corporation
- 当前专利权人: Nikon Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- 优先权: JPP2007-208749 20070810
- 主分类号: G03B27/54
- IPC分类号: G03B27/54 ; G03B27/42 ; G03F7/20
摘要:
There is disclosed a illumination optical apparatus for illuminating a second surface optically conjugate with a first surface via a reflection type original plate which can be arranged on the first surface, the illumination optical apparatus comprising: a first partial field stop arranged to define a first outer edge of a illumination region which is to be formed on the second surface, in order to limit a light beam traveling toward the first surface; and a second partial field stop arranged to define a second outer edge of the illumination region, in order to limit a light beam reflecting from the reflection type original plate which can be arranged on the first surface, wherein a first distance between the first partial field stop and the first surface is set to be larger than a second distance between the second partial field stop and the first surface.
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