发明授权
US08781213B2 Optical alignment systems for forming LEDs having a rough surface
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用于形成具有粗糙表面的LED的光学对准系统
- 专利标题: Optical alignment systems for forming LEDs having a rough surface
- 专利标题(中): 用于形成具有粗糙表面的LED的光学对准系统
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申请号: US13302308申请日: 2011-11-22
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公开(公告)号: US08781213B2公开(公告)日: 2014-07-15
- 发明人: Robert L. Hsieh , Khiem Nguyen , Warren W. Flack , Andrew M. Hawryluk
- 申请人: Robert L. Hsieh , Khiem Nguyen , Warren W. Flack , Andrew M. Hawryluk
- 申请人地址: US CA San Jose
- 专利权人: Ultratech, Inc.
- 当前专利权人: Ultratech, Inc.
- 当前专利权人地址: US CA San Jose
- 代理机构: Opticus IP Law PLLC
- 主分类号: G06K9/00
- IPC分类号: G06K9/00 ; G03F9/00 ; H01L33/22
摘要:
An alignment system for aligning a wafer when lithographically fabricating LEDs having an LED wavelength λLED is disclosed. The system includes the wafer. The wafer has a roughened alignment mark with a root-mean-square (RMS) surface roughness σS. The system has a lens configured to superimpose an image of the reticle alignment mark with an image of the roughened alignment mark. The roughened alignment marked image is formed with alignment light having a wavelength λA that is in the range from about 2σS to about 8σS. An image sensor detects the superimposed image. An image processing unit processes the detected superimposed image to measure an alignment offset between the wafer and the reticle.
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