Invention Grant
- Patent Title: Target supply apparatus, chamber, and extreme ultraviolet light generation apparatus
- Patent Title (中): 目标供应装置，室和极紫外光发生装置
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Application No.: US13929668Application Date: 2013-06-27
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Publication No.: US08785895B2Publication Date: 2014-07-22
- Inventor: Hiroshi Umeda , Taku Yamazaki , Hakaru Mizoguchi , Toshihiro Nishisaka
- Applicant: Gigaphoton Inc.
- Applicant Address: JP Tochigi
- Assignee: Gigaphoton Inc.
- Current Assignee: Gigaphoton Inc.
- Current Assignee Address: JP Tochigi
- Agency: McDermott Will & Emery LLP
- Priority: JP2012-145346 20120628
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G03F7/20
Abstract:
A target supply apparatus mounted in a chamber in which extreme ultraviolet light is generated by introducing a target material and a laser beam into the chamber may include a target generator having a nozzle, a first pipe configured to cover the nozzle, a cover opening provided in the first pipe to allow the target material to pass through the first pipe, and a first valve configured to open and close the cover opening.
Public/Granted literature
- US20140008552A1 TARGET SUPPLY APPARATUS, CHAMBER, AND EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS Public/Granted day:2014-01-09
Information query
