公开(公告)号：US08785895B2

公开(公告)日：2014-07-22

申请号：US13929668

申请日：2013-06-27

Applicant: Gigaphoton Inc.

Inventor： Hiroshi Umeda ,  Taku Yamazaki ,  Hakaru Mizoguchi ,  Toshihiro Nishisaka

IPC: H05G2/00 ,  G03F7/20

CPC classification number: H05G2/008 ,  G03F7/20 ,  G03F7/70033 ,  H05G2/001 ,  H05G2/006

Abstract: A target supply apparatus mounted in a chamber in which extreme ultraviolet light is generated by introducing a target material and a laser beam into the chamber may include a target generator having a nozzle, a first pipe configured to cover the nozzle, a cover opening provided in the first pipe to allow the target material to pass through the first pipe, and a first valve configured to open and close the cover opening.

Abstract translation: 安装在通过将目标材料和激光束引入室中而产生极紫外光的室中的目标供给装置可以包括具有喷嘴的目标发生器，被配置为覆盖喷嘴的第一管， 允许目标材料通过第一管的第一管和构造成打开和关闭盖开口的第一阀。