Invention Grant
US08786059B2 Passivation layer surface topography modifications for improved integrity in packaged assemblies 有权
钝化层表面形貌修改,以提高封装组件的完整性

Passivation layer surface topography modifications for improved integrity in packaged assemblies
Abstract:
A structure and method for producing the same is disclosed. The structure includes an organic passivation layer with solids suspended therein. Preferential etch to remove a portion of the organic material and expose portions of such solids creates enhanced surface roughness, which provides a significant advantage with respect to adhesion of that passivation layer to the packaging underfill material.
Information query
Patent Agency Ranking
0/0