Invention Grant
US08791500B2 Semiconductor device having lateral insulated gate bipolar transistor
有权
具有横向绝缘栅双极晶体管的半导体器件
- Patent Title: Semiconductor device having lateral insulated gate bipolar transistor
- Patent Title (中): 具有横向绝缘栅双极晶体管的半导体器件
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Application No.: US13719389Application Date: 2012-12-19
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Publication No.: US08791500B2Publication Date: 2014-07-29
- Inventor: Youichi Ashida , Shigeki Takahashi
- Applicant: Denso Corporation
- Applicant Address: JP Kariya
- Assignee: DENSO CORPORATION
- Current Assignee: DENSO CORPORATION
- Current Assignee Address: JP Kariya
- Agency: Posz Law Group, PLC
- Priority: JP2011-288244 20111228; JP2012-204594 20120918
- Main IPC: H01L29/74
- IPC: H01L29/74 ; H01L31/111

Abstract:
A semiconductor device having a lateral insulated gate bipolar transistor includes a first conductivity type drift layer, a second conductivity type collector region formed in a surface portion of the drift layer, a second conductivity type channel layer formed in the surface portion of the drift layer, a first conductivity type emitter region formed in a surface portion of the channel layer, and a hole stopper region formed in the drift layer and located between the collector region and the emitter region. Holes are injected from the collector region into the drift layer and flow toward the emitter region through a hole path. The hole stopper region blocks a flow of the holes and narrows the hole path to concentrate the holes.
Public/Granted literature
- US20130168730A1 SEMICONDUCTOR DEVICE HAVING LATERAL INSULATED GATE BIPOLAR TRANSISTOR Public/Granted day:2013-07-04
Information query
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