发明授权
US08795487B2 Physical vapor deposition chamber with rotating magnet assembly and centrally fed RF power
有权
具有旋转磁体组件的物理气相沉积室和集中供电的RF功率
- 专利标题： Physical vapor deposition chamber with rotating magnet assembly and centrally fed RF power
- 专利标题（中）： 具有旋转磁体组件的物理气相沉积室和集中供电的RF功率
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申请号： US13075841申请日： 2011-03-30
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公开(公告)号： US08795487B2公开(公告)日： 2014-08-05
- 发明人: Alan Ritchie , Keith Miller
- 申请人： Alan Ritchie , Keith Miller
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Moser Taboada
- 代理商 Alan Taboada
- 主分类号： C23C14/35
- IPC分类号： C23C14/35
摘要：
Embodiments of the present invention provide improved methods and apparatus for physical vapor deposition (PVD) processing of substrates. In some embodiments, an apparatus for physical vapor deposition (PVD) may include a target assembly having a target comprising a source material to be deposited on a substrate, an opposing source distribution plate disposed opposite a backside of the target and electrically coupled to the target along a peripheral edge of the target, and a cavity disposed between the backside of the target and the source distribution plate; an electrode coupled to the source distribution plate at a point coincident with a central axis of the target; and a magnetron assembly comprising a rotatable magnet disposed within the cavity and having an axis of rotation that is aligned with a central axis of the target assembly, wherein the magnetron assembly is not driven through the electrode.
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