Invention Grant
US08796082B1 Method of optimizing a GA—nitride device material structure for a frequency multiplication device 有权
优化用于倍频装置的GA-氮化物器件材料结构的方法

Method of optimizing a GA—nitride device material structure for a frequency multiplication device
Abstract:
A preferred method of optimizing a Ga-nitride device material structure for a frequency multiplication device comprises: determining the amplitude and frequency of the input signal being multiplied in frequency; providing a Ga-nitride region on a substrate; determining the Al percentage composition and impurity doping in an AlGaN region positioned on the Ga-nitride region based upon the power level and waveform of the input signal and the desired frequency range in order to optimize power input/output efficiency; and selecting an orientation of N-face polar GaN or Ga-face polar GaN material relative to the AlGaN/GaN interface so as to orient the face of the GaN so as to optimize charge at the AlGaN/GaN interface. A preferred embodiment comprises an anti-serial Schottky varactor comprising: two Schottky diodes in anti-serial connection; each comprising at least one GaN layer designed based upon doping and thickness to improve the conversion efficiency.
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