Invention Grant
US08796082B1 Method of optimizing a GA—nitride device material structure for a frequency multiplication device
有权
优化用于倍频装置的GA-氮化物器件材料结构的方法
- Patent Title: Method of optimizing a GA—nitride device material structure for a frequency multiplication device
- Patent Title (中): 优化用于倍频装置的GA-氮化物器件材料结构的方法
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Application No.: US13774387Application Date: 2013-02-22
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Publication No.: US08796082B1Publication Date: 2014-08-05
- Inventor: Pankaj B. Shah , H. Alfred Hung
- Applicant: U.S. Army Research Laboratory ATTN: RDRL-LOC-I
- Applicant Address: US DC Washington
- Assignee: The United States of America as represented by the Scretary of the Army
- Current Assignee: The United States of America as represented by the Scretary of the Army
- Current Assignee Address: US DC Washington
- Agent Lawrence E. Anderson
- Main IPC: H01L21/338
- IPC: H01L21/338

Abstract:
A preferred method of optimizing a Ga-nitride device material structure for a frequency multiplication device comprises: determining the amplitude and frequency of the input signal being multiplied in frequency; providing a Ga-nitride region on a substrate; determining the Al percentage composition and impurity doping in an AlGaN region positioned on the Ga-nitride region based upon the power level and waveform of the input signal and the desired frequency range in order to optimize power input/output efficiency; and selecting an orientation of N-face polar GaN or Ga-face polar GaN material relative to the AlGaN/GaN interface so as to orient the face of the GaN so as to optimize charge at the AlGaN/GaN interface. A preferred embodiment comprises an anti-serial Schottky varactor comprising: two Schottky diodes in anti-serial connection; each comprising at least one GaN layer designed based upon doping and thickness to improve the conversion efficiency.
Public/Granted literature
- US20140239305A1 METHOD OF OPTIMIZING A GA-NITRIDE DEVICE MATERIAL STRUCTURE FOR A FREQUENCY MULTIPLICATION DEVICE Public/Granted day:2014-08-28
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