Invention Grant
- Patent Title: Detector and inspecting apparatus
- Patent Title (中): 检测仪和检查仪器
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Application No.: US13853418Application Date: 2013-03-29
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Publication No.: US08796621B2Publication Date: 2014-08-05
- Inventor: Masahiro Hatakeyama , Shoji Yoshikawa , Kenichi Suematsu , Tsutomu Karimata , Nobuharu Noji
- Applicant: Ebara Corporation
- Applicant Address: JP Tokyo
- Assignee: Ebara Corporation
- Current Assignee: Ebara Corporation
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2005-234079 20050812
- Main IPC: G01N23/00
- IPC: G01N23/00 ; G21K7/00

Abstract:
An inspecting apparatus for reducing a time loss associated with a work for changing a detector is characterized by comprising a plurality of detectors 11, 12for receiving an electron beam emitted from a sample W to capture image data representative of the sample W, and a switching mechanism M for causing the electron beam to be incident on one of the plurality of detectors 11, 12, where the plurality of detectors 11, 12 are disposed in the same chamber MC. The plurality of detectors 11, 12 can be an arbitrary combination of a detector comprising an electron sensor for converting an electron beam into an electric signal with a detector comprising an optical sensor for converting an electron beam into light and converting the light into an electric signal. The switching mechanism M may be a mechanical moving mechanism or an electron beam deflector.
Public/Granted literature
- US20130228684A1 DETECTOR AND INSPECTING APPARATUS Public/Granted day:2013-09-05
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