Invention Grant
US08796690B2 Thin film transistor substrate, method of fabricating the same and flat display having the same
有权
薄膜晶体管基板,其制造方法和具有该薄膜晶体管基板的平面显示器
- Patent Title: Thin film transistor substrate, method of fabricating the same and flat display having the same
- Patent Title (中): 薄膜晶体管基板,其制造方法和具有该薄膜晶体管基板的平面显示器
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Application No.: US13804560Application Date: 2013-03-14
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Publication No.: US08796690B2Publication Date: 2014-08-05
- Inventor: Shin-Bok Lee , Seung-Hee Nam , Nam-Seok Lee
- Applicant: LG Display Co., Ltd.
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Morgan, Lewis & Bockius LLP
- Priority: KR10-2010-0055514 20100611
- Main IPC: H01L29/786
- IPC: H01L29/786 ; H01L27/12

Abstract:
A thin film transistor substrate and a method for fabricating the same are disclosed. A thin film transistor substrate includes a substrate comprising a plurality of grooves having different depths, respectively, to have a multi-step structure; gate and data lines alternatively crossed in the grooves to form a plurality of pixel areas; thin film transistors formed in the grooves of the substrate to be formed in cross portion of the gate and data lines, wherein active layers of the thin transistors are formed along the gate lines and gate electrodes, the active layers separated from active layers of neighboring pixel areas with the data line located there between.
Public/Granted literature
- US20130292678A1 Thin Film Transistor Substrate, Method of Fabricating the Same and Flat Display Having the Same Public/Granted day:2013-11-07
Information query
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