发明授权
- 专利标题: Radiation-sensitive resin composition
- 专利标题(中): 辐射敏感树脂组合物
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申请号: US12701592申请日: 2010-02-07
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公开(公告)号: US08802348B2公开(公告)日: 2014-08-12
- 发明人: Noboru Otsuka , Takanori Kawakami , Yukio Nishimura , Makoto Sugiura
- 申请人: Noboru Otsuka , Takanori Kawakami , Yukio Nishimura , Makoto Sugiura
- 申请人地址: JP Tokyo
- 专利权人: JSR Corporation
- 当前专利权人: JSR Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Dittavong & Steiner, P.C.
- 优先权: JP2007-208631 20070809
- 主分类号: G03F7/039
- IPC分类号: G03F7/039 ; G03F7/20 ; G03F7/30 ; G03F7/38
摘要:
A radiation-sensitive resin composition includes (A) an acid labile group-containing resin which becomes alkali-soluble by an action of an acid, (B) a radiation-sensitive acid generator, and (C) a solvent. The resin (A) includes repeating units shown by formulas (1) and (2), wherein R1 and R2 represent a hydrogen atom or a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, R3 represents a substituted or unsubstituted alkyl group having 1 to 4 carbon atoms, X represents a hydrogen atom, a hydroxyl group, or an acyl group, m represents an integer from 1 to 18, and n represents an integer from 4 to 8.
公开/授权文献
- US20100203447A1 RADIATION-SENSITIVE RESIN COMPOSITION 公开/授权日:2010-08-12
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