发明授权
US08802349B2 Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition
有权
光敏感或辐射敏感性树脂组合物和抗蚀剂膜和图案形成方法使用该组合物
- 专利标题： Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition
- 专利标题（中）： 光敏感或辐射敏感性树脂组合物和抗蚀剂膜和图案形成方法使用该组合物
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申请号： US13258898申请日： 2010-03-31
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公开(公告)号： US08802349B2公开(公告)日： 2014-08-12
- 发明人: Masahiro Yoshidome , Shuji Hirano , Hiroshi Saegusa , Kaoru Iwato , Yusuke Iizuka
- 申请人： Masahiro Yoshidome , Shuji Hirano , Hiroshi Saegusa , Kaoru Iwato , Yusuke Iizuka
- 申请人地址： JP Tokyo
- 专利权人： FUJIFILM Corporation
- 当前专利权人： FUJIFILM Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Sughrue Mion, PLLC
- 优先权： JP2009-088568 20090331; JP2009-256265 20091109
- 国际申请： PCT/JP2010/056290 WO 20100331
- 国际公布： WO2010/114176 WO 20101007
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/38 ; G03F7/039
摘要：
Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, the resin containing (a) a repeating unit represented by the following formula (AN-01), (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a resin that contains at least either a fluorine atom or a silicon atom and contains a repeating unit having a group capable of decomposing by the action of an alkali developer to increase the solubility in an alkali developer: wherein the variables in formula (AN-01) are defined in the description.
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