发明授权
- 专利标题: Display device and manufacturing process of display device
- 专利标题(中): 显示装置的显示装置和制造工艺
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申请号: US13596089申请日: 2012-08-28
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公开(公告)号: US08803150B2公开(公告)日: 2014-08-12
- 发明人: Takeshi Noda , Tetsufumi Kawamura
- 申请人: Takeshi Noda , Tetsufumi Kawamura
- 申请人地址: JP Tokyo
- 专利权人: Japan Display Inc.
- 当前专利权人: Japan Display Inc.
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2011-190006 20110831
- 主分类号: H01L29/04
- IPC分类号: H01L29/04 ; H01L31/20 ; H01L29/786 ; H01L27/12
摘要:
Provided a display device including a thin film transistor. The thin film transistor includes a gate electrode, a gate insulating layer which covers the gate electrode, an oxide semiconductor film above the gate insulating layer, a source electrode and a drain electrode which are respectively provided in contact with a first region and a second region, which are provided in the upper surface of the oxide semiconductor film, and a channel protective film which is provided in contact with a third region between the first region and the second region. In plan view, a region of the oxide semiconductor film, which overlaps with the gate electrode, is smaller than the third region, and a portion of the oxide semiconductor film except for a portion which overlaps with the gate electrode has a resistance lower than the portion.
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