Invention Grant
- Patent Title: Back-end-of-line metal-oxide-semiconductor varactors
- Patent Title (中): 后端金属氧化物半导体变容二极管
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Application No.: US13644918Application Date: 2012-10-04
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Publication No.: US08809155B2Publication Date: 2014-08-19
- Inventor: John J. Ellis-Monaghan , Michael J. Hauser , Zhong-Xiang He , Xuefeng Liu , Richard A. Phelps , Robert M. Rassel , Anthony K. Stamper
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Wood, Herron & Evans LLP
- Agent Anthony J. Canale
- Main IPC: H01L21/336
- IPC: H01L21/336

Abstract:
Device structures, design structures, and fabrication methods for a varactor. The device structure includes a first electrode formed on a dielectric layer, and a semiconductor body formed on the first electrode. The semiconductor body is comprised of a silicon-containing semiconductor material in an amorphous state or a polycrystalline state. The device structure further includes an electrode insulator formed on the semiconductor body and a second electrode formed on the electrode insulator.
Public/Granted literature
- US20140097434A1 BACK-END-OF-LINE METAL-OXIDE-SEMICONDUCTOR VARACTORS Public/Granted day:2014-04-10
Information query
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