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US08809155B2 Back-end-of-line metal-oxide-semiconductor varactors 有权
后端金属氧化物半导体变容二极管

Back-end-of-line metal-oxide-semiconductor varactors
Abstract:
Device structures, design structures, and fabrication methods for a varactor. The device structure includes a first electrode formed on a dielectric layer, and a semiconductor body formed on the first electrode. The semiconductor body is comprised of a silicon-containing semiconductor material in an amorphous state or a polycrystalline state. The device structure further includes an electrode insulator formed on the semiconductor body and a second electrode formed on the electrode insulator.
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