发明授权
US08817237B2 Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter
有权
光谱纯度滤光片，光刻设备和制造光谱纯度滤光片的方法
- 专利标题： Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter
- 专利标题（中）： 光谱纯度滤光片，光刻设备和制造光谱纯度滤光片的方法
-
申请号： US13392434申请日： 2010-07-21
-
公开(公告)号： US08817237B2公开(公告)日： 2014-08-26
- 发明人: Wouter Anthon Soer , Martin Jacobus Johan Jak , Ronald Dekker
- 申请人： Wouter Anthon Soer , Martin Jacobus Johan Jak , Ronald Dekker
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 国际申请： PCT/EP2010/060536 WO 20100721
- 国际公布： WO2011/023470 WO 20110303
- 主分类号： G03B27/32
- IPC分类号： G03B27/32 ; G03B27/72 ; G03F7/20 ; G21K1/10 ; G02B5/18
摘要：
A method of forming a spectral purity filter having a plurality of apertures configured to transmit extreme ultraviolet radiation and suppress transmission of a second type of radiation, in which trenches are formed in a base material in a pattern corresponding to the walls to be formed between the apertures. The trenches are filled with a grid material to form walls of the grid material, and the base material is selectively removed until the grid material is exposed and forms the spaces between the walls of the grid material for the apertures.
公开/授权文献
信息查询
