Invention Grant
- Patent Title: Method and layout of an integrated circuit
- Patent Title (中): 集成电路的方法和布局
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Application No.: US13778912Application Date: 2013-02-27
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Publication No.: US08819610B2Publication Date: 2014-08-26
- Inventor: Hsiang-Jen Tseng , Ting-Wei Chiang , Wei-Yu Chen , Ruei-Wun Sun , Hung-Jung Tseng , Shun Li Chen , Li-Chun Tien
- Applicant: Hsiang-Jen Tseng , Ting-Wei Chiang , Wei-Yu Chen , Ruei-Wun Sun , Hung-Jung Tseng , Shun Li Chen , Li-Chun Tien
- Applicant Address: TW
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW
- Agency: Lowe Hauptman & Ham, LLP
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
An integrated circuit layout includes a P-type active region, an N-type active region, a first metal connection, a second metal connection and a plurality of trunks. The plurality of trunks is formed substantially side-by-side, and in parallel with each other. The first metal connection is substantially disposed over the P-type active region, and is electrically connected with drain regions of PMOS transistors in the P-type active region. The second metal connection is substantially disposed over the N-type active region, and is electrically connected with drain regions of NMOS transistors in the N-type active region. The plurality of trunks is electrically connected with and is substantially perpendicular to the first metal connection and the second metal connection. A first trunk of the plurality of trunks has a width wider than a width of other trunks of the plurality of trunks and is arranged to be located between two groups of trunks.
Public/Granted literature
- US20140195997A1 METHOD AND LAYOUT OF AN INTEGRATED CIRCUIT Public/Granted day:2014-07-10
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