发明授权
- 专利标题： Overlay measurement apparatus, lithographic apparatus and device manufacturing method using such overlay measurement apparatus
- 专利标题（中）： 覆盖测量装置，光刻设备和使用这种覆盖测量装置的装置制造方法
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申请号： US13000229申请日： 2009-05-14
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公开(公告)号： US08823922B2公开(公告)日： 2014-09-02
- 发明人: Arie Jeffrey Den Boef
- 申请人： Arie Jeffrey Den Boef
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Sterne, Kessler, Goldstein & Fox, P.L.L.C.
- 国际申请： PCT/EP2009/055809 WO 20090514
- 国际公布： WO2009/156225 WO 20091230
- 主分类号： G03B27/72
- IPC分类号： G03B27/72 ; G03B27/42 ; G03B27/32
摘要：
An overlay measurement apparatus has a polarized light source for illuminating a sample with a polarized light beam and an optical system to capture light that is scattered by the sample. The optical system includes a polarizer for transmitting an orthogonal polarization component that is orthogonal to a polarization direction of the polarized light beam. A detector measures intensity of the orthogonal polarization component. A processing unit is connected to the detector, and is arranged to process the orthogonal polarization component for overlay metrology measurement using asymmetry data derived from the orthogonal polarization component.
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