Invention Grant
US08826198B2 Method and apparatus for enhancing signal strength for improved generation and placement of model-based sub-resolution assist features (MB-SRAF)
有权
用于增强信号强度的方法和装置，用于改进基于模型的子分辨率辅助特征（MB-SRAF）的生成和放置
- Patent Title: Method and apparatus for enhancing signal strength for improved generation and placement of model-based sub-resolution assist features (MB-SRAF)
- Patent Title (中): 用于增强信号强度的方法和装置，用于改进基于模型的子分辨率辅助特征（MB-SRAF）的生成和放置
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Application No.: US13892984Application Date: 2013-05-13
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Publication No.: US08826198B2Publication Date: 2014-09-02
- Inventor: Min-Chun Tsai , Been-Der Chen , Yen-Wen Lu
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G06F17/50
- IPC: G06F17/50
Abstract:
Model-Based Sub-Resolution Assist Feature (SRAF) generation process and apparatus are disclosed, in which an SRAF guidance map (SGM) is iteratively optimized to finally output an optimized set of SRAFs as a result of enhanced signal strength obtained by iterations involving SRAF polygons and SGM image. SRAFs generated in a prior round of iteration are incorporated in a mask layout to generate a subsequent set of SRAFs. The iterative process is terminated when a set of SRAF accommodates a desired process window or when a predefined process window criterion is satisfied. Various cost functions, representing various lithographic responses, may be predefined for the optimization process.
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