发明授权
- 专利标题： Electrical device including a functional element in a cavity
- 专利标题（中）： 电气设备包括空腔中的功能元件
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申请号： US13647845申请日： 2012-10-09
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公开(公告)号： US08829359B2公开(公告)日： 2014-09-09
- 发明人: Akihiro Kojima , Yoshiaki Sugizaki , Yoshiaki Shimooka
- 申请人： Akihiro Kojima , Yoshiaki Sugizaki , Yoshiaki Shimooka
- 申请人地址： JP Tokyo
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JP Tokyo
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权： JP2008-015510 20080125; JP2008-282499 20081031
- 主分类号： H05K1/16
- IPC分类号： H05K1/16
摘要：
A substrate includes a functional element. An insulating first film forms a cavity which stores the functional element, together with the substrate, and includes a plurality of through-holes. An insulating second film covers the plurality of through-holes, is formed on the first film, and has a gas permeability which is higher than that of the first film. An insulating third film is formed on the second film and has a gas permeability which is lower than the second film. An insulating fourth film is formed on the third film and has an elasticity which is larger than the third film.
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