发明授权
US08829645B2 Structure and method to form e-fuse with enhanced current crowding
有权
具有增强电流拥挤的电子熔丝的结构和方法
- 专利标题： Structure and method to form e-fuse with enhanced current crowding
- 专利标题（中）： 具有增强电流拥挤的电子熔丝的结构和方法
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申请号： US12137640申请日： 2008-06-12
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公开(公告)号： US08829645B2公开(公告)日： 2014-09-09
- 发明人: Deok-Kee Kim , Ahmet S Ozcan , Haining S Yang
- 申请人： Deok-Kee Kim , Ahmet S Ozcan , Haining S Yang
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理机构： Gibb & Riley, LLC
- 主分类号： H01L23/52
- IPC分类号： H01L23/52
摘要：
An e-fuse structure and method has an anode; a fuse link (a first end of the fuse link is connected to the anode); a cathode (a second end of the fuse link opposite the first end is connected to the cathode); and a silicide layer on the fuse link. The silicide layer has a first silicide region adjacent the anode and a second silicide region adjacent the cathode. The second silicide region comprises an impurity not contained within the first silicide region. Further, the first silicide region is thinner than the second silicide region.