发明授权
- 专利标题: Divided annular rib type plasma processing apparatus
- 专利标题(中): 分体环形肋型等离子体处理装置
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申请号: US13265316申请日: 2010-06-30
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公开(公告)号: US08833299B2公开(公告)日: 2014-09-16
- 发明人: Yuichi Shiina , Iwao Watanabe
- 申请人: Yuichi Shiina , Iwao Watanabe
- 申请人地址: JP Tokyo
- 专利权人: Ferrotec Corporation
- 当前专利权人: Ferrotec Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: DLA Piper LLP (US)
- 优先权: JP2009-157103 20090701
- 国际申请: PCT/JP2010/061193 WO 20100630
- 国际公布: WO2011/002036 WO 20110106
- 主分类号: C23C16/50
- IPC分类号: C23C16/50 ; C23C16/505 ; C23C16/509 ; C23C16/455 ; C23F1/00 ; H01L21/306 ; C23C14/32 ; H01J37/32 ; C23C14/56 ; C23C16/06 ; C23C16/22
摘要:
A plasma stream-derived deposited matter formed on an annular rib for droplet capture in a plasma processing apparatus is prevented from falling into a plasma generation portion and causing a short circuit. The annular rib for the droplet capture is divided into multiple rib segments. Thus, from the beginning of the formation of the deposited matter on the annular rib due to the aggregation of the material in the plasma stream, it is possible to reduce the size of the deposited matter. By reducing the size of this deposited matter, when a piece of the deposited matter falls into the plasma generation portion, the piece of the deposited matter gets into a groove portion provided between a cathode and a wall surface of the plasma generation portion, thereby preventing the electrical short circuit between the cathode and the wall surface.
公开/授权文献
- US20120031337A1 DIVIDED ANNULAR RIB TYPE PLASMA PROCESSING APPARATUS 公开/授权日:2012-02-09
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