Invention Grant
US08839960B2 Polymeric matrices formed from monomers comprising a protected amine group
有权
由包含被保护的胺基的单体形成的聚合物基质
- Patent Title: Polymeric matrices formed from monomers comprising a protected amine group
- Patent Title (中): 由包含被保护的胺基的单体形成的聚合物基质
-
Application No.: US12974054Application Date: 2010-12-21
-
Publication No.: US08839960B2Publication Date: 2014-09-23
- Inventor: Qingshan Jason Niu
- Applicant: Qingshan Jason Niu
- Applicant Address: US NY Schenectady
- Assignee: General Electric Company
- Current Assignee: General Electric Company
- Current Assignee Address: US NY Schenectady
- Agency: Borden Ladner Gervais LLP
- Agent Scott Pundsack
- Main IPC: B01D71/00
- IPC: B01D71/00 ; B01D69/12 ; B01D67/00 ; B01D71/56 ; B01D61/02
Abstract:
The present disclosure relates to polymeric matrices composed of protected amine compound residues and membranes composed from such polymeric matrices. In particular, the present disclosure relates to a polymeric matrix comprising amine compound residues, acyl compound residues and protected amine compound residues.
Public/Granted literature
- US20120152822A1 POLYMERIC MATRICES FORMED FROM MONOMERS COMPRISING A PROTECTED AMINE GROUP Public/Granted day:2012-06-21
Information query
