发明授权
- 专利标题： Charged particle beam microscope
- 专利标题（中）： 带电粒子束显微镜
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申请号： US13812899申请日： 2011-08-08
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公开(公告)号： US08841612B2公开(公告)日： 2014-09-23
- 发明人: Muneyuki Fukuda , Naomasa Suzuki , Tomoyasu Shojo , Noritsugu Takahashi , Hiroshi Suzuki , Hiroshi Makino
- 申请人： Muneyuki Fukuda , Naomasa Suzuki , Tomoyasu Shojo , Noritsugu Takahashi , Hiroshi Suzuki , Hiroshi Makino
- 申请人地址： JP Tokyo
- 专利权人： Hitachi High-Technologies Corporation
- 当前专利权人： Hitachi High-Technologies Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Crowell & Moring LLP
- 优先权： JP2010-214595 20100925
- 国际申请： PCT/JP2011/068091 WO 20110808
- 国际公布： WO2012/039206 WO 20120329
- 主分类号： G01N23/00
- IPC分类号： G01N23/00 ; H01J23/00 ; H01J37/26 ; H01J37/22 ; H01J37/28 ; G01K7/00 ; G01N23/22
摘要：
This charged particle beam microscope is characterized by being provided with selection means (153, 155) for a measurement processing method for detected particles (118) and by this means selecting a different measurement processing method for a scanning region with a large number of secondary electrons (115) emitted from a sample (114) and for a region with a small number of secondary electrons. Thus, in sample scanning using a charged particle beam microscope, an image in which the contrast of bottom holes and channel bottoms with few emitted secondary electrons is emphasized and images that emphasize shadow contrast can be acquired in a short period of time.
公开/授权文献
- US20130126733A1 Charged Particle Beam Microscope 公开/授权日：2013-05-23