发明授权
US08846552B2 Soluble terminally modified imide oligomer using 2-phenyl-4, 4′-diaminodiphenyl ether, varnish, cured product thereof, imide prepreg thereof, and fiber-reinforced laminate having excellent heat resistance
有权
可溶性末端改性酰亚胺低聚物,使用2-苯基-4,4'-二氨基二苯醚,清漆,其固化产物,其酰亚胺预浸料,以及具有优异耐热性的纤维增强层压材料
- 专利标题: Soluble terminally modified imide oligomer using 2-phenyl-4, 4′-diaminodiphenyl ether, varnish, cured product thereof, imide prepreg thereof, and fiber-reinforced laminate having excellent heat resistance
- 专利标题(中): 可溶性末端改性酰亚胺低聚物,使用2-苯基-4,4'-二氨基二苯醚,清漆,其固化产物,其酰亚胺预浸料,以及具有优异耐热性的纤维增强层压材料
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申请号: US13062132申请日: 2009-09-03
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公开(公告)号: US08846552B2公开(公告)日: 2014-09-30
- 发明人: Masahiko Miyauchi , Yuichi Ishida , Toshio Ogasawara , Rikio Yokota
- 申请人: Masahiko Miyauchi , Yuichi Ishida , Toshio Ogasawara , Rikio Yokota
- 申请人地址: JP Osaka JP Tokyo
- 专利权人: Kaneka Corporation,Japan Aerospace Exporation Agency
- 当前专利权人: Kaneka Corporation,Japan Aerospace Exporation Agency
- 当前专利权人地址: JP Osaka JP Tokyo
- 代理机构: Westerman, Hattori, Daniels & Adrian, LLP
- 优先权: JP2008-225838 20080903; JP2008-271903 20081022
- 国际申请: PCT/JP2009/065423 WO 20090903
- 国际公布: WO2010/027020 WO 20100311
- 主分类号: B32B5/26
- IPC分类号: B32B5/26 ; B05D3/10 ; C08G73/10 ; C08K5/3415 ; C09D179/08 ; C09J5/02 ; D04H3/14 ; D04H3/16 ; C07D209/48 ; C08L79/08 ; C08F290/06 ; C07D487/04 ; C08F299/00 ; C08F299/02 ; C08J5/24 ; C08K7/02
摘要:
A novel terminally modified imide oligomer having excellent solubility in organic solvents, excellent solution storage stability, and excellent molding properties such as low melt viscosity. Also, a varnish obtained by dissolving the terminally modified imide oligomer in an organic solvent; a cure product obtained by using the terminally modified imide oligomer and having excellent thermal and mechanical characteristics such as heat resistance, elastic modulus, tensile strength at break and tensile elongation at break; a prepreg; and a fiber-reinforced laminate. The soluble terminally modified imide oligomer is represented by general formula (1). In the formula, R1 and R2 each represents a divalent aromatic diamine residue; R3 and R4 each represents a tetravalent aromatic tetracarboxylic acid residue; R5 and R6 each represents a hydrogen atom or a phenyl group, with R5 or R6 being a phenyl group; m and n satisfy the following relations: m≧1, n≧0, 1≦m+n≦20 and 0.05≦m/(m+n)≦1; and the repeating units may be arranged in blocks or randomly.
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