Invention Grant
- Patent Title: Determining calibration parameters for a lithographic process
- Patent Title (中): 确定光刻工艺的校准参数
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Application No.: US13608776Application Date: 2012-09-10
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Publication No.: US08849008B2Publication Date: 2014-09-30
- Inventor: Xin Zhou , Yaogang Lian , Robert E. Gleason
- Applicant: Xin Zhou , Yaogang Lian , Robert E. Gleason
- Applicant Address: US CA Mountain View
- Assignee: Synopsys, Inc.
- Current Assignee: Synopsys, Inc.
- Current Assignee Address: US CA Mountain View
- Agency: Fenwick & West LLP
- Main IPC: G06K9/00
- IPC: G06K9/00 ; G03F7/20

Abstract:
A technique for determining a set of calibration parameters for use in a model of a photo-lithographic process is described. In this calibration technique, images of a test pattern that was produced using the photo-lithographic process are used to determine corresponding sets of calibration parameters. These images are associated with at least three different focal planes in an optical system, such as a photo-lithographic system that implements the photo-lithographic process. Moreover, an interpolation function is determined using the sets of calibration parameters. This interpolation function can be used to determine calibration parameters at an arbitrary focal plane in the photo-lithographic system for use in simulations of the photolithographic process, where the set of calibration parameters are used in a set of transmission cross coefficients in the model of the photo-lithographic process.
Public/Granted literature
- US20130004056A1 Determining Calibration Parameters For a Lithographic Process Public/Granted day:2013-01-03
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