Invention Grant
US08852853B2 Photo-mask and method for manufacturing liquid crystal display device using the same
有权
用于制造使用其的液晶显示装置的照相掩模和方法
- Patent Title: Photo-mask and method for manufacturing liquid crystal display device using the same
- Patent Title (中): 用于制造使用其的液晶显示装置的照相掩模和方法
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Application No.: US13178013Application Date: 2011-07-07
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Publication No.: US08852853B2Publication Date: 2014-10-07
- Inventor: Ki Hoon Kim , Ji-Yong Park , Jin-Suk Park , Sunghyuk Kim , Min-Chang Kim , Kyung Hyun Choi
- Applicant: Ki Hoon Kim , Ji-Yong Park , Jin-Suk Park , Sunghyuk Kim , Min-Chang Kim , Kyung Hyun Choi
- Applicant Address: KR Giheung-Gu, Yongin, Gyeonggi-Do
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Giheung-Gu, Yongin, Gyeonggi-Do
- Agent Robert E. Bushnell, Esq.
- Priority: KR10-2010-0123795 20101206
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G02F1/1333 ; G03F1/54 ; G02F1/1337 ; G02F1/1341
Abstract:
A photo-mask is capable of preventing stain defects and a method for fabricating a liquid crystal display device using the photo-mask which achieves the same capability. The photo-mask includes a transparent substrate configured to transmit ultraviolet light and a light shielding layer configured to block ultraviolet light on a surface of the transparent substrate. The light shielding layer includes an absorption layer configured to absorb ultraviolet light.
Public/Granted literature
- US20120141925A1 Photo-Mask and Method for Manufacturing Liquid Crystal Display Device Using the Same Public/Granted day:2012-06-07
Information query
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