发明授权
- 专利标题: Metal inks for improved contact resistance
- 专利标题(中): 用于改善接触电阻的金属油墨
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申请号: US13162193申请日: 2011-06-16
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公开(公告)号: US08853677B1公开(公告)日: 2014-10-07
- 发明人: Joerg Rockenberger , Yu Chen , Fabio Zürcher , Scott Haubrich
- 申请人: Joerg Rockenberger , Yu Chen , Fabio Zürcher , Scott Haubrich
- 申请人地址: NO Oslo
- 专利权人: Thin Film Electronics ASA
- 当前专利权人: Thin Film Electronics ASA
- 当前专利权人地址: NO Oslo
- 代理机构: Murabito Hao & Barnes LLP
- 代理商 Andrew D. Fortney
- 主分类号: H01L29/08
- IPC分类号: H01L29/08
摘要:
Metal ink compositions, methods of forming such compositions, and methods of forming conductive layers are disclosed. The ink composition includes a bulk metal, a transition metal source, and an organic solvent. The transition metal source may be a transition metal capable of forming a silicide, in an amount providing from 0.01 to 50 at. % of the transition metal relative to the bulk metal. Conductive structures may be made using such ink compositions by forming a silicon-containing layer on a substrate, printing a metal ink composition on the silicon-containing layer, and curing the composition. The metal inks of the present invention have high conductivity and form low resistivity contacts with silicon, and reduce the number of inks and printing steps needed to fabricate integrated circuits.
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