发明授权
US08871862B2 Molding compound on the basis of a copolyamide containing terephthalic acid and trimethylhexamethylene diamine units
有权
基于含有对苯二甲酸和三甲基六亚甲基二胺单元的共聚酰胺的成型化合物
- 专利标题: Molding compound on the basis of a copolyamide containing terephthalic acid and trimethylhexamethylene diamine units
- 专利标题(中): 基于含有对苯二甲酸和三甲基六亚甲基二胺单元的共聚酰胺的成型化合物
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申请号: US13377949申请日: 2010-07-08
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公开(公告)号: US08871862B2公开(公告)日: 2014-10-28
- 发明人: Andreas Pawlik , Martin Roos , Franz-Erich Baumann , Harald Haeger
- 申请人: Andreas Pawlik , Martin Roos , Franz-Erich Baumann , Harald Haeger
- 申请人地址: DE Essen
- 专利权人: Evonik Degussa GmbH
- 当前专利权人: Evonik Degussa GmbH
- 当前专利权人地址: DE Essen
- 代理机构: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- 优先权: DE102009027611 20090710
- 国际申请: PCT/EP2010/059809 WO 20100708
- 国际公布: WO2011/003973 WO 20110113
- 主分类号: C08L77/00
- IPC分类号: C08L77/00 ; C08G69/26 ; C08L77/06
摘要:
A molding compound, containing at least 30% by weight of a copolyamide, which is derived from the following monomers: a) 50 to 95 mole percent of the combination of a diamine, selected from the group consisting of 1,9-nonane diamine, 1,10-decane diamine, 1,11-undecane diamine and 1,12-dodecane diamine, and terephthalic acid, and b) 5 to 50 mole percent of the combination of a diamine, selected from the group consisting of 2,2,4-trimethylhexamethylene diamine, 2,4,4-trimethylhexamethylene diamine, and mixtures thereof, and terephthalic acid. The copolyamide is crystalline and has low water absorption.
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