Invention Grant
US08873600B2 System and method for high accuracy gas refill in a two chamber gas discharge laser system
有权
在二室气体放电激光系统中高精度气体补充的系统和方法
- Patent Title: System and method for high accuracy gas refill in a two chamber gas discharge laser system
- Patent Title (中): 在二室气体放电激光系统中高精度气体补充的系统和方法
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Application No.: US13174484Application Date: 2011-06-30
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Publication No.: US08873600B2Publication Date: 2014-10-28
- Inventor: Rui Jiang , Joshua Jon Thornes , Daniel Jason Riggs , Kevin Michael O'Brien
- Applicant: Rui Jiang , Joshua Jon Thornes , Daniel Jason Riggs , Kevin Michael O'Brien
- Applicant Address: US CA San Diego
- Assignee: Cymer, LLC
- Current Assignee: Cymer, LLC
- Current Assignee Address: US CA San Diego
- Agency: Gard & Kaslow LLP
- Main IPC: H01S3/22
- IPC: H01S3/22 ; H01S3/223 ; H01S3/036

Abstract:
Systems and methods for automatically performing a high accuracy gas refill in a laser chamber of a two chamber gas discharge laser such as an excimer laser are disclosed. Based upon a target pressure and halogen concentration that is either predetermined or entered by a user, and with no further user action, a non-halogen containing gas is added to the chamber to a first pressure, followed by the addition of halogen containing gas to a second pressure which is greater than a target pressure for the chamber, such that the halogen content in the gas at the second pressure is at a desired concentration. The gas in the chamber is bled until the pressure drops to the target pressure. The amount of non-halogen containing gas added is estimated automatically, and the amount of halogen containing gas is measured so that the desired concentration is obtained, taking into account both temperature and any gas remaining in the fill pipes from prior laser operation.
Public/Granted literature
- US20130000773A1 System and Method for High Accuracy Gas Refill in a Two Chamber Gas Discharge Laser System Public/Granted day:2013-01-03
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