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1.发明授权System and method for automatic gas optimization in a two-chamber gas discharge laser system 有权双室气体放电激光系统中自动气体优化的系统和方法公开(公告)号：US08411720B2
公开(公告)日：2013-04-02
申请号：US13174640
申请日：2011-06-30
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , H01S3/104 , H01S3/2251 , H01S3/2366
摘要： A system and method for automatically performing gas optimization after a refill in the chambers of a two chamber gas discharge laser such as an excimer laser is disclosed. The laser is continuously fired at a low power output, and the gas in the amplifier laser chamber bled if necessary until the discharge voltage meets or exceeds a minimum value without dropping the pressure below a minimum value. The power output is increased, and the gas bled again if necessary until the voltage and pressure meet or exceed the minimum values. The laser is then fired in a burst pattern that approximates the expected firing of the laser in operation, and the gas bled if necessary until the discharge voltage meets or exceeds the minimum value and the output energy meets or exceeds a minimum value, again without dropping the pressure in the chamber below the minimum value. Once the minimum values are provided, the process runs quickly without manual interaction.
摘要翻译： 公开了一种用于在诸如准分子激光器的二室气体放电激光器的腔室中的再填充后自动执行气体优化的系统和方法。 激光器以低功率输出连续点火，并且如果需要，放大器激光器室中的气体排出，直到放电电压达到或超过最小值，而不将压力降低到最小值以下。 功率输出增加，如有必要，气体再次流出，直到电压和压力达到或超过最小值。 然后激光器以突发模式发射，其近似于操作中激光器的预期发射，并且如果需要，气体流出，直到放电电压达到或超过最小值，并且输出能量满足或超过最小值，再次不会下降 室内的压力低于最小值。 一旦提供了最小值，该过程即可快速运行，无需手动交互。
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2.发明授权System and method for high accuracy gas refill in a two chamber gas discharge laser system 有权在二室气体放电激光系统中高精度气体补充的系统和方法公开(公告)号：US08873600B2
公开(公告)日：2014-10-28
申请号：US13174484
申请日：2011-06-30
CPC分类号： H01S3/036 , H01S3/22 , H01S3/225 , H01S3/2308 , H01S3/2366
摘要： Systems and methods for automatically performing a high accuracy gas refill in a laser chamber of a two chamber gas discharge laser such as an excimer laser are disclosed. Based upon a target pressure and halogen concentration that is either predetermined or entered by a user, and with no further user action, a non-halogen containing gas is added to the chamber to a first pressure, followed by the addition of halogen containing gas to a second pressure which is greater than a target pressure for the chamber, such that the halogen content in the gas at the second pressure is at a desired concentration. The gas in the chamber is bled until the pressure drops to the target pressure. The amount of non-halogen containing gas added is estimated automatically, and the amount of halogen containing gas is measured so that the desired concentration is obtained, taking into account both temperature and any gas remaining in the fill pipes from prior laser operation.
摘要翻译： 公开了用于在诸如准分子激光器的二室气体放电激光器的激光室中自动执行高精度气体补充的系统和方法。 基于用户预定或输入的目标压力和卤素浓度，并且在不再进一步的用户动作的情况下，将不含卤素的气体加入室中至第一压力，随后加入含卤素气体 第二压力大于室的目标压力，使得在第二压力下的气体中的卤素含量处于所需浓度。 室内的气体流出，直到压力下降到目标压力。 自动估算不含卤素气体的量，并测量含卤素气体的量，以便从先前的激光操作考虑到温度和填充管中剩余的任何气体，获得所需的浓度。
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3.发明申请System and Method for Automatic Gas Optimization in a Two-Chamber Gas Discharge Laser System 有权双室气体放电激光系统中气体自动优化的系统与方法公开(公告)号：US20130003773A1
公开(公告)日：2013-01-03
申请号：US13174640
申请日：2011-06-30
IPC分类号： H01S3/22
CPC分类号： H01S3/036 , H01S3/104 , H01S3/2251 , H01S3/2366
摘要： A system and method for automatically performing gas optimization after a refill in the chambers of a two chamber gas discharge laser such as an excimer laser is disclosed. The laser is continuously fired at a low power output, and the gas in the amplifier laser chamber bled if necessary until the discharge voltage meets or exceeds a minimum value without dropping the pressure below a minimum value. The power output is increased, and the gas bled again if necessary until the voltage and pressure meet or exceed the minimum values. The laser is then fired in a burst pattern that approximates the expected firing of the laser in operation, and the gas bled if necessary until the discharge voltage meets or exceeds the minimum value and the output energy meets or exceeds a minimum value, again without dropping the pressure in the chamber below the minimum value. Once the minimum values are provided, the process runs quickly without manual interaction.
摘要翻译： 公开了一种用于在诸如准分子激光器的二室气体放电激光器的腔室中的再填充后自动执行气体优化的系统和方法。 激光器以低功率输出连续点火，如果需要，放大器激光器室中的气体排出，直到放电电压达到或超过最小值，而不将压力降低到最小值以下。 功率输出增加，如有必要，气体再次流出，直到电压和压力达到或超过最小值。 然后激光器以突发模式发射，其近似于操作中激光器的预期点火，并且如果需要，气体流出，直到放电电压达到或超过最小值，并且输出能量满足或超过最小值，同时不会下降 室内的压力低于最小值。 一旦提供了最小值，该过程即可快速运行，无需手动交互。
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4.发明申请System and Method for High Accuracy Gas Refill in a Two Chamber Gas Discharge Laser System 有权双室气体放电激光系统中高精度气体补充的系统和方法公开(公告)号：US20130000773A1
公开(公告)日：2013-01-03
申请号：US13174484
申请日：2011-06-30
IPC分类号： B65B31/04
CPC分类号： H01S3/036 , H01S3/22 , H01S3/225 , H01S3/2308 , H01S3/2366
摘要： Systems and methods for automatically performing a high accuracy gas refill in a laser chamber of a two chamber gas discharge laser such as an excimer laser are disclosed. Based upon a target pressure and halogen concentration that is either predetermined or entered by a user, and with no further user action, a non-halogen containing gas is added to the chamber to a first pressure, followed by the addition of halogen containing gas to a second pressure which is greater than a target pressure for the chamber, such that the halogen content in the gas at the second pressure is at a desired concentration. The gas in the chamber is bled until the pressure drops to the target pressure. The amount of non-halogen containing gas added is estimated automatically, and the amount of halogen containing gas is measured so that the desired concentration is obtained, taking into account both temperature and any gas remaining in the fill pipes from prior laser operation.
摘要翻译： 公开了用于在诸如准分子激光器的二室气体放电激光器的激光室中自动执行高精度气体补充的系统和方法。 基于用户预定或输入的目标压力和卤素浓度，并且在不再进一步的用户动作的情况下，将不含卤素的气体加入室中至第一压力，随后加入含卤素气体 第二压力大于室的目标压力，使得在第二压力下的气体中的卤素含量处于所需浓度。 室内的气体流出，直到压力下降到目标压力。 自动估算不含卤素气体的量，并测量含卤素气体的量，以便从先前的激光操作考虑到温度和填充管中剩余的任何气体，获得所需的浓度。
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公开(公告)号：US20160345764A1
公开(公告)日：2016-12-01
申请号：US14545576
申请日：2015-05-26
摘要： A garnish tray for whole garnish includes a plurality of wells having an opening at one end defined by sidewalls extending from a top surface to a bottom surface to define a well depth; and a plurality of channels extending between adjacent wells, wherein the plurality of channels extend from the top surface to a channel depth equal to or less than the well depth. Also disclosed are processes for serving the whole garnish.
摘要翻译： 用于整个装饰的装饰托盘包括多个孔，其一端的开口由从顶表面延伸到底表面的侧壁限定以限定井深; 以及在相邻孔之间延伸的多个通道，其中所述多个通道从顶表面延伸到等于或小于井深度的通道深度。 还公开了用于服务整个装饰品的过程。
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