发明授权
- 专利标题: Thin film deposition apparatus
- 专利标题(中): 薄膜沉积装置
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申请号: US12907396申请日: 2010-10-19
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公开(公告)号: US08876975B2公开(公告)日: 2014-11-04
- 发明人: Yong-Sup Choi , Kang-ll Lee , Chang Mog Jo
- 申请人: Yong-Sup Choi , Kang-ll Lee , Chang Mog Jo
- 申请人地址: KR Yongin-si
- 专利权人: Samsung Display Co., Ltd.
- 当前专利权人: Samsung Display Co., Ltd.
- 当前专利权人地址: KR Yongin-si
- 代理机构: Christie, Parker & Hale, LLP
- 优先权: KR10-2009-0099314 20091019; KR10-2010-0014277 20100217
- 主分类号: C23C14/02
- IPC分类号: C23C14/02 ; C23C14/24 ; C23C16/04 ; C23C16/448 ; C23C16/455 ; H01L21/02 ; C23C14/04 ; C23C14/12 ; C23C14/56
摘要:
A thin film deposition apparatus can be simply applied to produce large-sized display devices on a mass scale and improves manufacturing yield. The thin film deposition apparatus for forming a thin film on a substrate includes: a deposition source that discharges a deposition material; a deposition source nozzle unit disposed at a side of the deposition source and including a plurality of deposition source nozzles arranged in a first direction; and a patterning slit sheet disposed opposite to the deposition source nozzle unit and including a plurality of patterning slits arranged in the first direction; wherein each of the patterning slits includes a plurality of sub-slits.
公开/授权文献
- US20110088622A1 THIN FILM DEPOSITION APPARATUS 公开/授权日:2011-04-21
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