Invention Grant
US08887550B2 Two degree of freedom dithering platform for MEMS sensor calibration
有权
用于MEMS传感器校准的两自由度抖动平台
- Patent Title: Two degree of freedom dithering platform for MEMS sensor calibration
- Patent Title (中): 用于MEMS传感器校准的两自由度抖动平台
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Application No.: US13345132Application Date: 2012-01-06
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Publication No.: US08887550B2Publication Date: 2014-11-18
- Inventor: Ryan Supino , Eugen Cabuz , Burgess R. Johnson , Robert D. Horning
- Applicant: Ryan Supino , Eugen Cabuz , Burgess R. Johnson , Robert D. Horning
- Applicant Address: US NJ Morristown
- Assignee: Honeywell International Inc.
- Current Assignee: Honeywell International Inc.
- Current Assignee Address: US NJ Morristown
- Agency: Fogg & Powers
- Main IPC: G01P21/00
- IPC: G01P21/00 ; G01D5/34

Abstract:
Systems and methods for two degree of freedom dithering for micro-electro-mechanical system (MEMS) sensor calibration are provided. In one embodiment, a method for a device comprises forming a MEMS sensor layer, the MEMS sensor layer comprising a MEMS sensor and an in-plane rotator to rotate the MEMS sensor in the plane of the MEMS sensor layer. Further, the method comprises forming a first and second rotor layer and bonding the first rotor layer to a top surface and the second rotor layer to the bottom surface of the MEMS sensor layer, such that a first and second rotor portion of the first and second rotor layers connect to the MEMS sensor. Also, the method comprises separating the first and second rotor portions from the first and second rotor layers, wherein the first and second rotor portions and the MEMS sensor rotate about an in-plane axis of the MEMS sensor layer.
Public/Granted literature
- US20120272731A1 TWO DEGREE OF FREEDOM DITHERING PLATFORM FOR MEMS SENSOR CALIBRATION Public/Granted day:2012-11-01
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