Invention Grant
- Patent Title: Method for manufacturing optoelectronic devices
- Patent Title (中): 制造光电器件的方法
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Application No.: US13455207Application Date: 2012-04-25
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Publication No.: US08889436B2Publication Date: 2014-11-18
- Inventor: Wu-Tsung Lo , Yu-Chih Yang , Rong-Ren Lee
- Applicant: Wu-Tsung Lo , Yu-Chih Yang , Rong-Ren Lee
- Applicant Address: TW Hsinchu
- Assignee: Epistar Corporation
- Current Assignee: Epistar Corporation
- Current Assignee Address: TW Hsinchu
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method for manufacturing optoelectronic devices comprising the steps of: providing a common growth substrate; forming a light-emitting epitaxy structure on the common growth substrate; forming a stripping layer on the light-emitting epitaxy structure; forming a solar cell epitaxy structure on the stripping layer; forming an adhesive layer on the solar cell epitaxy structure; proving a solar cell permanent substrate on the adhesive layer; and removing the stripping layer to form a light-emitting device and a solar cell device separately.
Public/Granted literature
- US20130286634A1 METHOD FOR MANUFACTURING OPTOELECTRONIC DEVICES Public/Granted day:2013-10-31
Information query
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