发明授权
- 专利标题： Multi-particle beam column having an electrode layer including an eccentric aperture
- 专利标题（中）： 多粒子束柱具有包括偏心孔的电极层
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申请号： US13752040申请日： 2013-01-28
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公开(公告)号： US08890092B2公开(公告)日： 2014-11-18
- 发明人: Ho Seob Kim , Dae Wook Kim , Seung Jun Ahn , Tae Sik Oh
- 申请人： Ho Seob Kim , Dae Wook Kim , Seung Jun Ahn , Tae Sik Oh
- 申请人地址： KR Tangjeon-myeon, Asan-si, Chungcheongnam-do
- 专利权人： Industry—University Cooperation Foundation Sunmoon University
- 当前专利权人： Industry—University Cooperation Foundation Sunmoon University
- 当前专利权人地址： KR Tangjeon-myeon, Asan-si, Chungcheongnam-do
- 代理机构： Park Law Firm
- 代理商 John K. Park
- 主分类号： G21K5/00
- IPC分类号： G21K5/00 ; G21K1/08 ; G21K5/04
摘要：
Disclosed herein is a multi-particle beam column including electrode layer with eccentric apertures. The multi-particle beam column includes two or more particle beam columns each comprising a particle beam emission source, a deflector, and two or more electrode layers. The multi-particle beam column includes at least one electrode layer having one or more apertures that are eccentric from respective beam optical axes of the particle beam columns.
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