发明授权
- 专利标题: Active metamaterial device and manufacturing method of the same
- 专利标题(中): 活性超材料器件及其制造方法相同
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申请号: US13431142申请日: 2012-03-27
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公开(公告)号: US08890767B2公开(公告)日: 2014-11-18
- 发明人: Choon Gi Choi , Muhan Choi , Sung-Yool Choi
- 申请人: Choon Gi Choi , Muhan Choi , Sung-Yool Choi
- 申请人地址: KR Daejeon
- 专利权人: Electronics and Telecommunications Research Institute
- 当前专利权人: Electronics and Telecommunications Research Institute
- 当前专利权人地址: KR Daejeon
- 优先权: KR10-2011-0062935 20110628
- 主分类号: G02B27/00
- IPC分类号: G02B27/00 ; H01Q15/00
摘要:
Provided are an active metamaterial device operating at a high speed and a manufacturing method thereof. The active metamaterial device includes a first dielectric layer, a lower electrode disposed on the first dielectric layer, a second dielectric layer disposed on the lower electrode, metamaterial patterns disposed on the second dielectric layer, a couple layer disposed on the metamaterial patterns and the second dielectric layer, a third dielectric layer disposed on the couple layer, and an upper electrode disposed on the third dielectric layer.
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