A high voltage vertical field effect transistor device (101) is fabricated in a substrate (102, 104) using angled implantations (116, 120) into trench sidewalls formed above recessed gate poly layers (114) to form self-aligned N+ regions (123) adjacent to the trenches and along an upper region of an elevated substrate. With a trench fill insulator layer (124) formed over the recessed gate poly layers (114), self-aligned P+ body contact regions (128) are implanted into the elevated substrate without counter-doping the self-aligned N+ regions (123), and a subsequent recess etch removes the elevated substrate, leaving self-aligned N+ source regions (135-142) and P+ body contact regions (130-134).