发明授权
- 专利标题: Defect inspection method and defect inspection device
- 专利标题(中): 缺陷检查方法和缺陷检查装置
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申请号: US13996613申请日: 2011-11-25
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公开(公告)号: US08908171B2公开(公告)日: 2014-12-09
- 发明人: Masami Makuuchi , Takahiro Jingu
- 申请人: Masami Makuuchi , Takahiro Jingu
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Antonelli, Terry, Stout & Kraus, LLP.
- 优先权: JP2010-285284 20101222
- 国际申请: PCT/JP2011/006555 WO 20111125
- 国际公布: WO2012/086128 WO 20120628
- 主分类号: G01N21/00
- IPC分类号: G01N21/00 ; G01N21/95
摘要:
When the intensity of scattering light from a defect on a sample becomes very low according to the diameter of the defect, the dark noise from a sensor device itself accounts which a large proportion of the detected signal outputted from the sensor and thus it is difficult to detect minute defects. Furthermore, since a laser light source is pulsed into oscillation, pulse components from the laser light source are superimposed on the detected signal outputted from the sensor, and therefore it is difficult to detect defects with high accuracy. The present invention is a defect inspection device having irradiation means which producing pulsed operation and irradiating a surface of a sample with a laser beam, detection means which detecting scattering light generated at the surface of the sample in response to the irradiation provided by the irradiation means, and a processing portion which generating a delay signal based on the laser beam emitted by the irradiation means and processing the scattering light detected by the detection means using the delay signal.
公开/授权文献
- US20130286387A1 DEFECT INSPECTION METHOD AND DEFECT INSPECTION DEVICE 公开/授权日:2013-10-31
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