发明授权
US08927393B1 Water soluble mask formation by dry film vacuum lamination for laser and plasma dicing
有权
通过用于激光和等离子体切割的干膜真空层压形成水溶性掩模
- 专利标题: Water soluble mask formation by dry film vacuum lamination for laser and plasma dicing
- 专利标题(中): 通过用于激光和等离子体切割的干膜真空层压形成水溶性掩模
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申请号: US14167548申请日: 2014-01-29
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公开(公告)号: US08927393B1公开(公告)日: 2015-01-06
- 发明人: Wei-Sheng Lei , James S. Papanu , Prabhat Kumar , Brad Eaton , Ajay Kumar
- 申请人: Wei-Sheng Lei , James S. Papanu , Prabhat Kumar , Brad Eaton , Ajay Kumar
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Blakely Sokoloff Taylor Zafman LLP
- 主分类号: H01L21/3065
- IPC分类号: H01L21/3065 ; H01L21/82 ; H01L21/67
摘要:
Methods and systems for dicing a semiconductor wafer including a plurality of integrated circuits (ICs) are described. In one embodiment, a method involves adhering an adhesive tape to a thin water soluble dry film. The method involves applying the thin water soluble dry film adhered to the adhesive tape over a surface of the semiconductor wafer. The method involves removing the adhesive tape from the thin water soluble dry film. The thin water soluble dry film is patterned with a laser scribing process, exposing regions of the semiconductor wafer between the ICs. The method involves etching the semiconductor wafer through gaps in the patterned thin water soluble dry film, and removing the thin water soluble dry film.
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