Invention Grant
- Patent Title: Electron emission element and method for manufacturing the same
- Patent Title (中): 电子发射元件及其制造方法
-
Application No.: US13868182Application Date: 2013-04-23
-
Publication No.: US08928215B2Publication Date: 2015-01-06
- Inventor: Jin Seok Park , Bu Jong Kim , Won Kim , Sang Hyuk Lee
- Applicant: Intellectual Discovery Co., Ltd.
- Applicant Address: KR Seoul
- Assignee: Intellectual Discovery Co., Ltd.
- Current Assignee: Intellectual Discovery Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Lexyoume IP Meister, PLLC
- Priority: KR10-2013-0033108 20130327
- Main IPC: H01J1/304
- IPC: H01J1/304 ; H01J9/02 ; B82Y30/00
Abstract:
An electron emission device and a method of manufacturing the same are provided. The electron emission device includes i) a hydrophilic resin substrate and ii) carbon nano tubes that are positioned on the resin substrate. Surface roughness Ra of the resin substrate is 7.3 μm to 9.75 μm.
Public/Granted literature
- US20140292181A1 ELECTRON EMISSION ELEMENT AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2014-10-02
Information query
