发明授权
US08930156B2 Metrology through use of feed forward feed sideways and measurement cell re-use 有权
通过使用前馈饲料进行横向计量和测量细胞再利用

Metrology through use of feed forward feed sideways and measurement cell re-use
摘要:
Metrology may be implemented during semiconductor device fabrication by a) modeling a first measurement on a first test cell formed in a layer of a partially fabricated device; b) performing a second measurement on a second test cell in the layer; c) feeding information from the second measurement into the modeling of the first measurement; and after a lithography pattern has been formed on the layer including the first and second test cells, d) modeling a third and a fourth measurement on the first and second test cells respectively using information from a) and b) respectively.
信息查询
0/0