Invention Grant
- Patent Title: Charged particle beam device
- Patent Title (中): 带电粒子束装置
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Application No.: US13812842Application Date: 2011-06-08
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Publication No.: US08933422B2Publication Date: 2015-01-13
- Inventor: Ryoichi Ishii , Takashi Doi , Osamu Sato , Yasushi Ebizuka
- Applicant: Ryoichi Ishii , Takashi Doi , Osamu Sato , Yasushi Ebizuka
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2010-168773 20100728
- International Application: PCT/JP2011/003213 WO 20110608
- International Announcement: WO2012/014362 WO 20120202
- Main IPC: H01J37/18
- IPC: H01J37/18 ; H01J37/16

Abstract:
The objective of the present invention is to provide a charged particle beam device such that a tip part can be effectually maintained in a clean state, while the frequency of valve body replacements is also reduced. To achieve the objective, a charged particle beam device is offered, comprising: a partition that is positioned between a charged particle source-side vacuum space and a specimen stage-side vacuum space, said partition further comprising an opening for a charged particle beam to pass through; a driver mechanism that moves a shutter member between a first location within the optical axis of the charged particle beam and a second location outside the optical axis of the charged particle beam; and a control device that controls the driver mechanism. The first location is a location wherein the shutter member is distanced from the partition, and the control device carries out a control that opens a valve between the specimen chamber and the exchange chamber when the shutter member is in a state of being located in the first location.
Public/Granted literature
- US20130200271A1 CHARGED PARTICLE BEAM DEVICE Public/Granted day:2013-08-08
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