Invention Grant
- Patent Title: Gas analysis apparatus
- Patent Title (中): 气体分析仪
-
Application No.: US14238520Application Date: 2012-08-10
-
Publication No.: US08934101B2Publication Date: 2015-01-13
- Inventor: Takuya Ido , Toshikazu Ohnishi , Tetsuya Mori
- Applicant: Takuya Ido , Toshikazu Ohnishi , Tetsuya Mori
- Applicant Address: JP Kyoto
- Assignee: Horiba, Ltd.
- Current Assignee: Horiba, Ltd.
- Current Assignee Address: JP Kyoto
- Agency: Brooks Kushman P.C.
- Priority: JP2011-177339 20110812; JP2011-281515 20111222
- International Application: PCT/JP2012/070461 WO 20120810
- International Announcement: WO2013/024808 WO 20130221
- Main IPC: G01N21/61
- IPC: G01N21/61 ; G01N21/35 ; G01N21/27 ; G01N21/53 ; G01N21/85

Abstract:
A gas analysis apparatus includes: a first reflector that reflects measurement light from a light emitting unit disposed outside a gas flue wall and transmitted through a sample gas. A light receiving unit outside the gas flue wall receives measurement light reflected by the first reflector. A second reflector outside the gas flue wall reflects measurement light toward the light receiving unit. A computing unit analyzes sample gas by allowing the measurement light to be reflected by the first reflector and performs correction or calibration of the gas analysis apparatus using known substances within an associated containing unit along the light path between the light emitting unit and the second reflector by allowing measurement light to be reflected by the second reflector. A switching unit outside the gas flue wall selectively removes or inserts the second reflector from the light path during component concentration analysis and correction or calibration, respectively.
Public/Granted literature
- US20140211209A1 GAS ANALYSIS APPARATUS Public/Granted day:2014-07-31
Information query