Invention Grant
- Patent Title: Calixarene and photoresist composition comprising same
- Patent Title (中): 杯芳烃和包含其的光致抗蚀剂组合物
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Application No.: US13624579Application Date: 2012-09-21
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Publication No.: US08936900B2Publication Date: 2015-01-20
- Inventor: Vipul Jain , D. Patrick Green , James W. Thackeray , Brad C. Bailey , Su Jin Kang
- Applicant: Rohm and Haas Electronic Materials LLC , Dow Global Technologies LLC
- Applicant Address: US MA Marlborough US MI Midland
- Assignee: Rohm and Haas Electronic Materials LLC,Dow Global Technologies LLC
- Current Assignee: Rohm and Haas Electronic Materials LLC,Dow Global Technologies LLC
- Current Assignee Address: US MA Marlborough US MI Midland
- Agency: Cantor Colburn LLP
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C07C43/02 ; C07C309/00

Abstract:
A molecular glass compound comprises a vinyl ether adduct of an aromatic vinyl ether of formula C(R1)2═C(R2)—O-(L)n-Ar1, and a calix[4]arene, wherein R1 and R2 are each independently a single bond, H, C1-20 alkyl, C1-20 haloalkyl, C6-20 aryl, C6-20 haloaryl, C7-20 aralkyl, or C7-20 haloaralkyl, L is a C1-20 linking group, n is 0 or 1, and Ar1 is a halo-containing monocyclic, or substituted or unsubstituted polycyclic or fused polycyclic C6-20 aromatic-containing moiety, wherein R1 and R2 are connected to Ar1 when either or both of R1 and R2 is a single bond and n is 0. A photoresist, comprising the molecular glass compound, a solvent, and a photoacid generator, a coated substrate, comprising (a) a substrate having one or more layers to be patterned on a surface thereof; and (b) a layer of a photoresist composition over the one or more layers to be patterned, and a method of forming the molecular glass compound, are also disclosed.
Public/Granted literature
- US20130078569A1 CALIXARENE AND PHOTORESIST COMPOSITION COMPRISING SAME Public/Granted day:2013-03-28
Information query
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