发明授权
- 专利标题: Integrated circuits comprising an active transistor electrically connected to a trench capacitor by an overlying contact
- 专利标题(中): 集成电路包括通过上覆触点与沟槽电容器电连接的有源晶体管
-
申请号: US13454635申请日: 2012-04-24
-
公开(公告)号: US08937345B2公开(公告)日: 2015-01-20
- 发明人: John E. Barth, Jr. , Kangguo Cheng , Michael Sperling , Geng Wang
- 申请人: John E. Barth, Jr. , Kangguo Cheng , Michael Sperling , Geng Wang
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 代理机构: Cantor Colburn LLP
- 代理商 Joseph Abate
- 主分类号: H01L27/108
- IPC分类号: H01L27/108 ; H01L21/768 ; H01L23/485
摘要:
An integrated circuit includes an active transistor laterally adjacent to a trench capacitor formed in a semiconductor substrate, the active transistor comprising a source junction and a drain junction, wherein a barrier layer is disposed along a periphery of the trench capacitor for isolating the trench capacitor; a passive transistor laterally spaced from the active transistor, wherein at least a portion of the trench capacitor is interposed between the active and passive transistors; an interlevel dielectric disposed upon the active and passive transistors; and a first conductive contact extending through the interlevel dielectric to the drain junction of the active transistor and the at least a portion of the trench capacitor between the active and passive transistors, wherein the first conductive contact electrically connects the trench capacitor to the drain junction of the active transistor.
公开/授权文献
信息查询
IPC分类: