发明授权
- 专利标题： Photosensitive resin and process for producing microlens
- 专利标题（中）： 光敏树脂和微透镜生产工艺
-
申请号： US12451474申请日： 2008-05-14
-
公开(公告)号： US08940470B2公开(公告)日： 2015-01-27
- 发明人: Takayuki Negi , Takahiro Sakaguchi , Takahiro Kishioka
- 申请人： Takayuki Negi , Takahiro Sakaguchi , Takahiro Kishioka
- 申请人地址： JP Tokyo
- 专利权人： Nissan Chemical Industries, Inc.
- 当前专利权人： Nissan Chemical Industries, Inc.
- 当前专利权人地址： JP Tokyo
- 代理机构： Oliff PLC
- 优先权： JP2007-131444 20070517
- 国际申请： PCT/JP2008/058860 WO 20080514
- 国际公布： WO2008/143095 WO 20081127
- 主分类号： G03F7/023
- IPC分类号： G03F7/023 ; G03F7/38 ; G03F7/00 ; G02B3/00
摘要：
A material for a microlens having heat resistance, high resolution and high light-extraction efficiency is provided. A positive resist composition comprises an alkali-soluble polymer containing a unit structure having an aromatic fused ring or a derivative thereof, and a compound having an organic group which undergoes photodecomposition to yield an alkali-soluble group. The positive resist composition has coating film properties of a refractive index at a wavelength of 633 nm of 1.6 or more and a transmittance at wavelengths of 400 to 730 nm of 80% or more. A pattern forming method comprises applying the positive resist composition, drying the composition, exposing the composition to light, and developing the composition.
公开/授权文献
- US20100096663A1 PHOTOSENSITIVE RESIN AND PROCESS FOR PRODUCING MICROLENS 公开/授权日：2010-04-22
信息查询
IPC分类:
