公开(公告)号：US08940470B2

公开(公告)日：2015-01-27

申请号：US12451474

申请日：2008-05-14

申请人： Takayuki Negi ,  Takahiro Sakaguchi ,  Takahiro Kishioka

发明人： Takayuki Negi ,  Takahiro Sakaguchi ,  Takahiro Kishioka

IPC分类号： G03F7/023 ,  G03F7/38 ,  G03F7/00 ,  G02B3/00

CPC分类号： G03F7/0233 ,  G02B3/00 ,  G03F7/0005 ,  G03F7/38

摘要： A material for a microlens having heat resistance, high resolution and high light-extraction efficiency is provided. A positive resist composition comprises an alkali-soluble polymer containing a unit structure having an aromatic fused ring or a derivative thereof, and a compound having an organic group which undergoes photodecomposition to yield an alkali-soluble group. The positive resist composition has coating film properties of a refractive index at a wavelength of 633 nm of 1.6 or more and a transmittance at wavelengths of 400 to 730 nm of 80% or more. A pattern forming method comprises applying the positive resist composition, drying the composition, exposing the composition to light, and developing the composition.

摘要翻译： 提供了具有耐热性，高分辨率和高光提取效率的微透镜材料。 正型抗蚀剂组合物包含含有具有芳香稠合环或其衍生物的单元结构的碱溶性聚合物和具有经历光分解以产生碱溶性基团的有机基团的化合物。 正型抗蚀剂组合物具有在633nm的折射率为1.6以上的折射率和400〜730nm的波长的透射率为80％以上的涂膜性质。 图案形成方法包括施加正性抗蚀剂组合物，干燥组合物，使组合物曝光并显影组合物。

公开(公告)号：US20100096663A1

公开(公告)日：2010-04-22

申请号：US12451474

申请日：2008-05-14

申请人： Takayuki Negi ,  Takahiro Sakaguchi ,  Takahiro Kishioka

发明人： Takayuki Negi ,  Takahiro Sakaguchi ,  Takahiro Kishioka

IPC分类号： H01L33/00 ,  G03F7/004 ,  G03F7/20 ,  H01L31/0232

CPC分类号： G03F7/0233 ,  G02B3/00 ,  G03F7/0005 ,  G03F7/38

摘要： A material for a microlens having heat resistance, high resolution and high light-extraction efficiency is provided. A positive resist composition comprises an alkali-soluble polymer (A) containing a unit structure having an aromatic fused ring or a derivative thereof, and a compound (B) having an organic group which undergoes photodecomposition to yield an alkali-soluble group. The positive resist composition has coating film properties of a refractive index at a wavelength of 633 nm of 1.6 or more and a transmittance at wavelengths of 400 to 730 nm of 80% or more. A pattern forming method comprises applying the positive resist composition, drying the composition, exposing the composition to light, and developing the composition.

摘要翻译： 提供了具有耐热性，高分辨率和高光提取效率的微透镜材料。 正型抗蚀剂组合物包含含有具有芳香稠合环或其衍生物的单元结构的碱溶性聚合物（A）和具有经历光分解以产生碱溶性基团的有机基团的化合物（B）。 正型抗蚀剂组合物具有在633nm的折射率为1.6以上的折射率和400〜730nm的波长的透射率为80％以上的涂膜性质。 图案形成方法包括施加正性抗蚀剂组合物，干燥组合物，使组合物曝光并显影组合物。