Invention Grant
- Patent Title: Radiation source, lithographic apparatus and device manufacturing method
- Patent Title (中): 辐射源，光刻设备和器件制造方法
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Application No.: US13686633Application Date: 2012-11-27
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Publication No.: US08946661B2Publication Date: 2015-02-03
- Inventor: Erik Roelof Loopstra , Gerardus Hubertus Petrus Maria Swinkels , Vadim Yevgenyevich Banine , Johannes Hubertus Josephina Moors
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G21K5/00
- IPC: G21K5/00 ; H05G2/00 ; G03F7/20 ; G21K1/06
Abstract:
A radiation source is configured to produce extreme ultraviolet radiation. The radiation source includes a chamber in which, in use, a plasma is generated, and an evaporation surface configured to evaporate a material formed as a by-product from the plasma and that is emitted to the evaporation surface. A method for removing a by-product material in or from a plasma radiation source of a lithographic apparatus includes evaporating a material which, in use, is emitted to that surface from the plasma.
Public/Granted literature
- US20130327955A1 RADIATION SOURCE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD Public/Granted day:2013-12-12
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