Invention Grant
- Patent Title: Transistor and method of fabricating the same
- Patent Title (中): 晶体管及其制造方法
-
Application No.: US13912350Application Date: 2013-06-07
-
Publication No.: US08952422B2Publication Date: 2015-02-10
- Inventor: Hokyun Ahn , Jong-Won Lim , Jeong-Jin Kim , Hae Cheon Kim , Jae Kyoung Mun , Eun Soo Nam
- Applicant: Electronics and Telecommunications Research Institute
- Applicant Address: KR Daejeon
- Assignee: Electronics and Telecommunications Research Institute
- Current Assignee: Electronics and Telecommunications Research Institute
- Current Assignee Address: KR Daejeon
- Agency: Rabin & Berdo, P.C.
- Priority: KR10-2012-0148675 20121218
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L29/423 ; H01L29/778 ; H01L29/20

Abstract:
A field effect transistor includes an active layer and a capping layer sequentially stacked on a substrate, and a gate electrode penetrating the capping layer and being adjacent to the active layer. The gate electrode includes a foot portion adjacent to the active layer and a head portion having a width greater than a width of the foot portion. The foot portion of an end part of the gate electrode has a width less than a width of the head portion of another part of the gate electrode and greater than a width of the foot portion of the another part of the gate electrode. The foot portion of the end part of the gate electrode further penetrates the active layer so as to be adjacent to the substrate.
Public/Granted literature
- US20140167111A1 TRANSISTOR AND METHOD OF FABRICATING THE SAME Public/Granted day:2014-06-19
Information query
IPC分类: